Works (15)

2009 conference paper

Predeposition plasma nitridation process applied to Ge substrates to passivate interfaces between crystalline-Ge substrates and Hf-based high-K dielectrics

Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 27(1), 294–299.

By: G. Lucovsky, J. Long, K. Chung, H. Seo, B. Watts, R. Vasic, M. Ulrich

Source: NC State University Libraries
Added: August 6, 2018

2008 journal article

Bulk defects in nano-crystalline and in non-crystalline HfO2-based thin film dielectrics

Thin Solid Films, 517(1), 437–440.

By: S. Lee, H. Seo, G. Lucovsky, L. Fleming, M. Ulrich & J. Luning

Source: NC State University Libraries
Added: August 6, 2018

2008 journal article

Suppression of Ge-O and Ge-N bonding at Ge-HfO2 and Ge-TiO2 interfaces by deposition onto plasma-nitrided passivated Ge substrates: Integration issues Ge gate stacks into advanced devices

Microelectronics Reliability, 48(3), 364–369.

By: S. Lee, J. Long, G. Lucovsky, J. Whitten, H. Seo & J. Luning

Source: NC State University Libraries
Added: August 6, 2018

2008 journal article

Suppression of defect states in HfSiON gate dielectric films on n-type Ge(100) substrates

Applied Physics Letters, 93(18).

By: K. Chung, H. Seo, J. Long & G. Lucovsky

Source: NC State University Libraries
Added: August 6, 2018

2007 journal article

Defect reduction by suppression of pi-bonding coupling in nano- and non-crystalline high-(medium)-kappa gate dielectrics

Microelectronic Engineering, 84(9-10), 2350–2353.

By: G. Lucovsky, H. Seo, S. Lee, L. Fleming, M. Ulrich & J. Luning

Source: NC State University Libraries
Added: August 6, 2018

2007 journal article

Intrinsic electronically active defects in transition metal elemental oxides

Communications & Review Papers, 46(4B), 1899–1909.

By: G. Lucovsky, H. Seo, S. Lee, L. Fleming, M. Ulrich, J. Luning, P. Lysaght, G. Bersuker

Source: NC State University Libraries
Added: August 6, 2018

2007 journal article

Length scales for coherent pi-bonding interactions in complex high-k oxide dielectrics and their interfaces

Microelectronic Engineering, 84(9-10), 2298–2301.

By: H. Seo, G. Lucovsky, L. Fleming, M. Ulrich, J. Luning, G. Koster, T. Geballe

Source: NC State University Libraries
Added: August 6, 2018

2007 journal article

Spectroscopic studies of O-vacancy defects in transition metal oxides

Journal of Materials Science. Materials in Electronics., 18, S263–266.

By: G. Lucovsky, J. Luning, L. Fleming, M. Ulrich, J. Rowe, H. Seo, S. Lee, P. Lysaght, G. Bersuker

Source: NC State University Libraries
Added: August 6, 2018

2007 journal article

Studies of bonding defects, and defect state suppression in HfO2 by soft X-ray absorption and photoelectron spectroscopies

Surface Science, 601(18), 4236–4241.

By: G. Lucovsky, H. Seo, L. Fleming, J. Luning, P. Lysaght & G. Bersuker

Source: NC State University Libraries
Added: August 6, 2018

2007 article

Suppression of Jahn-Teller term-split band edge states in the X-ray absorption spectra of non-crystalline Zr silicates and Si oxynitride alloys, and alloys of ZrO2 with Y2O3 (vol 75, pg 1591, 2006)

Radiation Physics and Chemistry, Vol. 76, p. 907.

By: G. Lucovsky, C. Fulton, B. Ju, N. Stoute, H. Seo, D. Aspnes, J. Luning

Source: NC State University Libraries
Added: August 6, 2018

2007 journal article

Total dose and bias temperature stress effects for HfSiON on Si MOS capacitors

IEEE Transactions on Nuclear Science, 54(6), 1931–1937.

By: D. Chen, E. Mamouni, X. Zhou, R. Schrimpf, D. Fleetwood, K. Galloway, S. Lee, H. Seo ...

Source: NC State University Libraries
Added: August 6, 2018

2006 journal article

Intrinsic nanocrystalline grain-boundary and oxygen atom vacancy defects in ZrO2 and HfO2

Radiation Physics and Chemistry, 75(11), 2097–2101.

By: G. Lucovsky, C. Hinkle, C. Fulton, N. Stoute, H. Seo & J. Luning

Source: NC State University Libraries
Added: August 6, 2018

2005 journal article

Characterization of remote inductively coupled CH4-N-2 plasma for carbon nitride thin-film deposition

Journal of Applied Physics, 98(4).

By: H. Seo, J. Kim, K. Chung, J. Kim, S. Kim & H. Jeon

Source: NC State University Libraries
Added: August 6, 2018

2005 journal article

Deposition and plasma measurements of Zr-oxide films with low impurity concentrations by remote PEALD

Electrochemical and Solid State Letters, 8(3), G82–84.

By: J. Kim, S. Kim, H. Seo, J. Kim & H. Jeon

Source: NC State University Libraries
Added: August 6, 2018

2005 journal article

Surface characteristics of indium-tin oxide cleaned by remote plasma

Japanese Journal of Applied Physics. Part 1, Regular Papers, Short Notes & Review Papers, 44(2), 1041–1044.

By: S. Kim, H. Seo, Y. Kim, K. Kim, Y. Tak & H. Jeon

Source: NC State University Libraries
Added: August 6, 2018