2009 conference paper
Predeposition plasma nitridation process applied to Ge substrates to passivate interfaces between crystalline-Ge substrates and Hf-based high-K dielectrics
Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 27(1), 294–299.
2008 journal article
Bulk defects in nano-crystalline and in non-crystalline HfO2-based thin film dielectrics
THIN SOLID FILMS, 517(1), 437–440.
2008 journal article
Suppression of defect states in HfSiON gate dielectric films on n-type Ge(100) substrates
APPLIED PHYSICS LETTERS, 93(18).
2007 article
Defect reduction by suppression of pi-bonding coupling in nano- and non-crystalline high-(medium)-kappa gate dielectrics
MICROELECTRONIC ENGINEERING, Vol. 84, pp. 2350–2353.
2007 article
Intrinsic electronically active defects in transition metal elemental oxides
Lucovsky, G., Seo, H., Lee, S., Fleming, L. B., Ulrich, M. D., Luning, J., … Bersuker, G. (2007, April). JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, Vol. 46, pp. 1899–1909.
2007 article
Length scales for coherent pi-bonding interactions in complex high-k oxide dielectrics and their interfaces
MICROELECTRONIC ENGINEERING, Vol. 84, pp. 2298–2301.
2007 article
Spectroscopic studies of O-vacancy defects in transition metal oxides
Lucovsky, G., Luening, J., Fleming, L. B., Ulrich, M. D., Rowe, J. E., Seo, H., … Bersuker, G. (2007, October). JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, Vol. 18, pp. S263–S266.
2007 article
Studies of bonding defects, and defect state suppression in HfO2 by soft X-ray absorption and photoelectron spectroscopies
Lucovsky, G., Seo, H., Fleming, L. B., Luening, J., Lysaght, P., & Bersuker, G. (2007, September 15). SURFACE SCIENCE, Vol. 601, pp. 4236–4241.
2007 journal article
Suppression of Ge-O and Ge-N bonding at Ge-HfO2 and Ge-TiO2 interfaces by deposition onto plasma-nitrided passivated Ge substrates: Integration issues Ge gate stacks into advanced devices
MICROELECTRONICS RELIABILITY, 48(3), 364–369.
2007 article
Total dose and bias temperature stress effects for HfSiON on Si MOS capacitors
Chen, D. K., Mamouni, E. E., Zhou, X. J., Schrimpf, R. D., Fleetwood, D. M., Galloway, K. F., … Cressler, J. D. (2007, December). IEEE TRANSACTIONS ON NUCLEAR SCIENCE, Vol. 54, pp. 1931–1937.
2006 article
Intrinsic nanocrystalline grain-boundary and oxygen atom vacancy defects in ZrO2 and HfO2
Lucovsky, G., Hinkle, C. L., Fulton, C. C., Stoute, N. A., Seo, H., & Luning, J. (2006, November). RADIATION PHYSICS AND CHEMISTRY, Vol. 75, pp. 2097–2101.
2006 article
Suppression of Jahn-Teller term-split band edge states in the x-ray absorption spectra of non-crystalline Zr silicates and Si oxynitride alloys, and alloys of ZrO2 with Y2O3
Lucovsky, G., Fulton, C. C., Ju, B. S., Stoute, N. A., Tao, S., Aspnes, D. E., & Luening, J. (2006, November). RADIATION PHYSICS AND CHEMISTRY, Vol. 75, pp. 1591–1595.
2005 journal article
Characterization of remote inductively coupled CH4-N-2 plasma for carbon nitride thin-film deposition
Journal of Applied Physics, 98(4).
2005 journal article
Deposition and plasma measurements of Zr-oxide films with low impurity concentrations by remote PEALD
ELECTROCHEMICAL AND SOLID STATE LETTERS, 8(3), G82–G84.
2005 journal article
Surface characteristics of indium-tin oxide cleaned by remote plasma
Japanese Journal of Applied Physics. Part 1, Regular Papers, Short Notes & Review Papers, 44(2), 1041–1044.
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