Center for Dielectrics and Piezoelectrics

Works Published in 1992

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1992 article

SELECTIVE DEPOSITION AND BOND STRAIN RELAXATION IN SILICON PECVD USING TIME MODULATED SILANE FLOW

PARSONS, G. N., BOLAND, J. J., & TSANG, J. C. (1992, June). JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, Vol. 31, pp. 1943–1947.

By: G. Parsons*, J. Boland* & J. Tsang*

Contributors: G. Parsons*, J. Boland* & J. Tsang*

author keywords: PLASMA ENHANCED DEPOSITION; TIME MODULATED GAS FLOW; MICROCRYSTALLINE SILICON; POLYCRYSTALLINE SILICON; SELECTIVE SILICON DEPOSITION; CRYSTALLITE FORMATION; BOND STRAIN RELAXATION; HYDROGEN SILICON INTERACTIONS; RAMAN SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY
Sources: Web Of Science, ORCID, NC State University Libraries
Added: August 6, 2018

1992 journal article

ENHANCED MOBILITY TOP-GATE AMORPHOUS-SILICON THIN-FILM TRANSISTOR WITH SELECTIVELY DEPOSITED SOURCE DRAIN CONTACTS

IEEE ELECTRON DEVICE LETTERS, 13(2), 80–82.

By: G. Parsons*

Contributors: G. Parsons*

Sources: Web Of Science, ORCID, NC State University Libraries
Added: August 6, 2018

1992 journal article

BOND SELECTIVITY IN SILICON FILM GROWTH

SCIENCE, 256(5061), 1304–1306.

Contributors: J. Boland* & G. Parsons*

TL;DR: The evolution of the film structure during hydrogen exposure is directly observed by scanning tunneling microscopy, and a model describing the role of hydrogen is presented. (via Semantic Scholar)
UN Sustainable Development Goal Categories
10. Reduced Inequalities (OpenAlex)
Sources: Web Of Science, ORCID, NC State University Libraries
Added: August 6, 2018

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