Center for Dielectrics and Piezoelectrics

Works Published in 1998

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Displaying all 11 works

Sorted by most recent date added to the index first, which may not be the same as publication date order.

1998 chapter

Thin film transistors fabricated with poly-Si films crystallized by microwave annealing

In Flat-Panel Display Materials-1998 (Vol. 508, pp. 139–144). http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000077248500021&KeyUID=WOS:000077248500021

By: Y. Choi, J. Lee, T. Jang, B. Ahn, G. Parsons, C. Tsai, T. Fahlen, C. Seager

Contributors: Y. Choi, J. Lee, T. Jang, B. Ahn, G. Parsons, C. Tsai, T. Fahlen, C. Seager

Source: ORCID
Added: June 22, 2023

1998 chapter

Synthesis and characterization of luminescent ZnO powders produced by thermally-induced doping

In Flat-Panel Display Materials-1998 (Vol. 508, pp. 275–280). http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000077248500042&KeyUID=WOS:000077248500042

By: B. Allieri, L. Depero, L. Sangaletti, L. Antonini, M. Bettinelli, G. Parsons, C. Tsai, T. Fahlen, C. Seager

Contributors: B. Allieri, L. Depero, L. Sangaletti, L. Antonini, M. Bettinelli, G. Parsons, C. Tsai, T. Fahlen, C. Seager

Source: ORCID
Added: June 22, 2023

1998 chapter

Reaction processes for low temperature (< 150 degrees C) plasma enhanced deposition of hydrogenated amorphous silicon thin film transistors on transparent plastic substrates

In Flat-Panel Display Materials-1998 (Vol. 508, pp. 19–24). http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000077248500003&KeyUID=WOS:000077248500003

By: G. Parsons, C. Yang, T. Klein, L. Smith, C. Tsai, T. Fahlen, C. Seager

Contributors: G. Parsons, C. Yang, T. Klein, L. Smith, C. Tsai, T. Fahlen, C. Seager

Source: ORCID
Added: June 22, 2023

1998 journal article

Reaction processes for low temperature (< 150 degrees C) plasma enhanced deposition of hydrogenated amorphous silicon thin film transistors on transparent plastic substrates

Amorphous and Microcrystalline Silicon Technology-1998, 507, 19–24. http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000079335700003&KeyUID=WOS:000079335700003

By: G. Parsons, C. Yang, T. Klein, L. Smith, R. Schropp, H. Branz, M. Hack, I. Shimizu, S. Wagner

Contributors: G. Parsons, C. Yang, T. Klein, L. Smith, R. Schropp, H. Branz, M. Hack, I. Shimizu, S. Wagner

Source: ORCID
Added: June 22, 2023

1998 chapter

High conductivity gate metallurgy for TFT/LCD's

In Flat-Panel Display Materials-1998 (Vol. 508, pp. 37–46). http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000077248500006&KeyUID=WOS:000077248500006

By: P. Fryer, E. Colgan, E. Galligan, W. Graham, R. Horton, L. Jenkins, R. John, Y. Kuo ...

Contributors: P. Fryer, E. Colgan, E. Galligan, W. Graham, R. Horton, L. Jenkins, R. John, Y. Kuo ...

Source: ORCID
Added: June 22, 2023

1998 journal article

In-situ mass spectrometry for real-time uniformity sensing in ECR silicon dioxide etching

Journal of Vacuum Science & Technology, B(16), 2996–3002.

By: J. Chambers, K. Min & G. Parsons

Source: NC State University Libraries
Added: August 6, 2018

1998 journal article

Endpoint uniformity sensing and analysis in silicon dioxide plasma etching using in situ mass spectrometry

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16(6), 2996–3002.

Contributors: J. Chambers*, K. Min & G. Parsons

UN Sustainable Development Goal Categories
13. Climate Action (Web of Science)
Sources: Web Of Science, ORCID, NC State University Libraries
Added: August 6, 2018

1998 article

Silane consumption and conversion analysis in amorphous silicon and silicon nitride plasma deposition using in situ mass spectroscopy

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, Vol. 16, pp. 1852–1856.

Contributors: A. Chowdhury n, T. Klein n, T. Anderson n & G. Parsons n

Sources: Web Of Science, ORCID, NC State University Libraries
Added: August 6, 2018

1998 journal article

Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation

Journal of Vacuum Science &Amp; Technology a-Vacuum Surfaces and Films, 16(3), 1316–1320.

By: L. Smith n, W. Read n, C. Yang n, E. Srinivasan n, C. Courtney n, H. Lamb n, G. Parsons n

Contributors: L. Smith n, W. Read n, C. Yang n, E. Srinivasan n, C. Courtney n, H. Lamb n, G. Parsons n

Sources: NC State University Libraries, ORCID, NC State University Libraries
Added: August 6, 2018

1998 journal article

Self-aligned gate and source drain contacts in inverted-staggered a-Si : H thin-film transistors fabricated using selective area silicon PECVD

IEEE ELECTRON DEVICE LETTERS, 19(6), 180–182.

By: C. Yang n, W. Read n, C. Arthur n, E. Srinivasan n & G. Parsons n

Contributors: C. Yang n, W. Read n, C. Arthur n, E. Srinivasan n & G. Parsons n

Sources: Web Of Science, ORCID, NC State University Libraries
Added: August 6, 2018

1998 journal article

Hydrogen abstraction kinetics and crystallization in low temperature plasma deposition of silicon

APPLIED PHYSICS LETTERS, 72(4), 456–458.

By: E. Srinivasan n & G. Parsons n

Contributors: E. Srinivasan n & G. Parsons n

UN Sustainable Development Goal Categories
7. Affordable and Clean Energy (OpenAlex)
Sources: Web Of Science, ORCID, NC State University Libraries
Added: August 6, 2018

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