Displaying all 3 works
Sorted by most recent date added to the index first, which may not be the same as publication date order.
1999 journal article
Plasma enhanced chemical vapor deposited silicon nitride thin films deposited at very low temperatures for thin film transistors on plastic substrates"
Journal of Vacuum Science & Technology, A(17), 108–112.
1999 article
Hydrogenated silicon nitride thin films deposited between 50 and 250 degrees C using nitrogen/silane mixtures with helium dilution
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, Vol. 17, pp. 108–112.
Contributors: T. Klein n, T. Anderson n, A. Chowdhury n & G. Parsons n
1999 journal article
Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)
APPLIED PHYSICS LETTERS, 75(25), 4001–4003.
Contributors: T. Klein n, D. Niu n, W. Epling n, W. Li n, D. Maher n, C. Hobbs*, R. Hegde*, I. Baumvol*, G. Parsons n
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