Displaying all 6 works
Sorted by most recent date added to the index first, which may not be the same as publication date order.
1997 chapter
Real-time kinetic analysis of hydrogen abstraction and etching reactions using pulsed-gas PECVD of amorphous and microcrystalline silicon
In Amorphous and Microcrystalline Silicon Technology - 1997 (Vol. 467, pp. 501–506). http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000071462000075&KeyUID=WOS:000071462000075
Contributors: E. Srinivasan, G. Parsons , S. Wagner, M. Hack, E. Schiff, R. Schropp, I. Shimizu
1997 chapter
Comparison of conventional and self-aligned a-Si:H thin film transistors
In Flat Panel Display Materials Iii (Vol. 471, pp. 179–184). http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:A1997BJ69K00027&KeyUID=WOS:A1997BJ69K00027
Contributors: C. Yang, W. Read, C. Arthur, G. Parsons , R. Fulks, D. Slobodin, T. Yuzuriha
1997 journal article
Real-time process sensing and metrology in amorphous and selective area silicon plasma enhanced chemical vapor deposition using in situ mass spectrometry
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 15(1), 127–132.
Contributors: A. Chowdhury, W. Read, G. Rubloff, L. Tedder & G. Parsons
1997 journal article
Investigation of substrate dependent nucleation of plasma-deposited microcrystalline silicon on glass and silicon substrates using atomic force microscopy
JOURNAL OF APPLIED PHYSICS, 82(12), 6041–6046.
Contributors: L. Smith n, E. Srinivasan n & G. Parsons n
1997 journal article
Hydrogen elimination and phase transitions in pulsed-gas plasma deposition of amorphous and microcrystalline silicon
JOURNAL OF APPLIED PHYSICS, 81(6), 2847–2855.
Contributors: E. Srinivasan n & G. Parsons n
1997 journal article
Dominant monohydride bonding in hydrogenated amorphous silicon thin films formed by plasma enhanced chemical vapor deposition at room temperature
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 15(1), 77–84.
Contributors: E. Srinivasan n, D. Lloyd n & G. Parsons n
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