Center for Dielectrics and Piezoelectrics

Works Published in 1989

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Displaying all 15 works

Sorted by most recent date added to the index first, which may not be the same as publication date order.

1989 journal article

ULTRAFAST RECOMBINATION AND TRAPPING IN AMORPHOUS-SILICON

Journal of Non-Crystalline Solids, 114, 573–575.

By: A. Esser, K. Seibert, H. Kurz, G. Parsons* , C. Wang, B. Davidson, G. Lucovsky, R. Nemanich

Contributors: A. Esser, K. Seibert, H. Kurz, G. Parsons* , C. Wang, B. Davidson, G. Lucovsky, R. Nemanich

Source: ORCID
Added: June 22, 2023

1989 journal article

REDUCTION OF DEFECTS BY HIGH-TEMPERATURE ANNEALING (150-DEGREES-C-240-DEGREES-C) IN HYDROGENATED AMORPHOUS-SILICON FILMS DEPOSITED AT ROOM-TEMPERATURE

Journal of Non-Crystalline Solids, 114, 178–180.

By: G. Parsons n , C. Wang  n, M. Williams n & G. Lucovsky n

Contributors: G. Parsons n , C. Wang  n, M. Williams n & G. Lucovsky n

Source: ORCID
Added: June 22, 2023

1989 journal article

RAMAN-SCATTERING FROM MICROCRYSTALLINE SI FILMS - CONSIDERATIONS OF COMPOSITE STRUCTURES WITH DIFFERENT OPTICAL-ABSORPTION PROPERTIES

Journal of Non-Crystalline Solids, 114, 813–815.

By: R. Nemanich  n, E. Buehler n, Y. Legrice n, R. Shroder n, G. Parsons n , C. Wang  n, G. Lucovsky n, J. Boyce*

Contributors: R. Nemanich  n, E. Buehler n, Y. Legrice n, R. Shroder n, G. Parsons n , C. Wang  n, G. Lucovsky n, J. Boyce*

Source: ORCID
Added: June 22, 2023

1989 journal article

PRECURSORS FOR THE DEPOSITION OF AMORPHOUS-SILICON HYDROGEN ALLOYS BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION

Journal of Vacuum Science &Amp; Technology a-Vacuum Surfaces and Films, 7(3), 1124–1129.

By: G. Parsons n , D. Tsu n, C. Wang  n & G. Lucovsky n

Contributors: G. Parsons n , D. Tsu n, C. Wang  n & G. Lucovsky n

Source: ORCID
Added: June 22, 2023

1989 journal article

OPTICAL-EMISSION AND MASS SPECTROSCOPIC STUDIES OF THE GAS-PHASE DURING THE DEPOSITION OF SIO2 AND A-SI-H BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

Journal of Vacuum Science &Amp; Technology a-Vacuum Surfaces and Films, 7(3), 1115–1123.

By: D. Tsu n, G. Parsons n , G. Lucovsky n & M. Watkins n

Contributors: D. Tsu n, G. Parsons n , G. Lucovsky n & M. Watkins n

Source: ORCID
Added: June 22, 2023

1989 journal article

LOW-TEMPERATURE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON (A-SI-H) - CONTROL OF POLYHYDRIDE INCORPORATION AND ITS EFFECTS ON THIN-FILM PROPERTIES

Solar Cells, 27(1-4), 121–136.

By: G. Lucovsky n, G. Parsons n , C. Wang  n, B. Davidson n & D. Tsu n

Contributors: G. Lucovsky n, G. Parsons n , C. Wang  n, B. Davidson n & D. Tsu n

Source: ORCID
Added: June 22, 2023

1989 journal article

INCORPORATION OF POLYHYDRIDE BONDING GROUPS INTO THIN-FILMS OF HYDROGENATED AMORPHOUS-SILICON (A-SI-H)

Journal of Non-Crystalline Solids, 114, 154–156.

By: G. Lucovsky n, B. Davidson n, G. Parsons n  & C. Wang  n

Contributors: G. Lucovsky n, B. Davidson n, G. Parsons n  & C. Wang  n

Source: ORCID
Added: June 22, 2023

1989 journal article

EFFECTS OF GAS ADDITIVES ON THE PROPERTIES OF A-SI-H FILMS

Journal of Non-Crystalline Solids, 114, 193–195.

By: C. Wang  n, G. Parsons n  & G. Lucovsky n

Contributors: C. Wang  n, G. Parsons n  & G. Lucovsky n

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6. Clean Water and Sanitation (OpenAlex)
Source: ORCID
Added: June 22, 2023

1989 journal article

DEPENDENCE OF A-SI-H/SI3N4 INTERFACE PROPERTIES ON THE DEPOSITION SEQUENCE IN AMORPHOUS-SILICON THIN-FILM TRANSISTOR PRODUCED BY REMOTE PECVD PROCESS

Journal of Non-Crystalline Solids, 115(1-3), 69–71.

By: S. Kim n, G. Parsons n , G. Fountain* & G. Lucovsky n

Contributors: S. Kim n, G. Parsons n , G. Fountain* & G. Lucovsky n

Source: ORCID
Added: June 22, 2023

1989 journal article

DEFECTS IN A-SI-H FILMS PRODUCED BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION

Journal of Non-Crystalline Solids, 107(2-3), 295–300.

By: G. Parsons* , D. Tsu & G. Lucovsky

Contributors: G. Parsons* , D. Tsu & G. Lucovsky

Source: ORCID
Added: June 22, 2023

1989 journal article

Reduction of defects by high temperature (180 degrees c-240 degrees c) annealing in room temperature deposited hydrogenated amorphous silicon

Journal of Non-Crystalline Solids, 114.

By: G. Parsons , C. Wang & G. Lucovsky

Source: NC State University Libraries
Added: August 6, 2018

1989 journal article

Precursors for the deposition of amorphous silicon hydrogen alloys by remote plasma enhanced CVD

Journal of Vacuum Science & Technology, A(7), 1124–1129.

By: G. Parsons , D. Tsu, C. Wang & G. Lucovsky

Source: NC State University Libraries
Added: August 6, 2018

1989 journal article

Mass and optical emission spectroscopic studies of the gas phase during the deposition of SiO2 and a-Si:H by remote plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology, A(7), 1115–1123.

By: D. Tsu, G. Parsons , G. Lucovsky & M. Watkins

Source: NC State University Libraries
Added: August 6, 2018

1989 journal article

Dependence of the chemical, electrical and photoelectronic properties of a-Si:H/Si3N4 interfaces on the deposition sequence

Journal of Non-Cyrstalline Solids, 114.

By: S. Kim, G. Parsons  & G. Lucovsky

Source: NC State University Libraries
Added: August 6, 2018

1989 journal article

Defects in a-Si:H films produced by remote plasma enhanced CVD

Journal of Non-Crystalline Solids, 107, 295–300.

By: G. Parsons , T. Tsu & G. Lucovsky

Source: NC State University Libraries
Added: August 6, 2018

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